美国网友:西方制裁,没美国技术,中国能造出芯片来吗（上）_风闻

Yes, China must develop its own modern advanced immersion lithography machine because the West has drawn up the hostile and unfair Wassenauer Agreement against China, the Agreement on Export Control of Conventional Arms and Dual-Use Goods and Technologies.

是啊，中国必须发展自己的现代先进的浸没式光刻机，因为西方对中国拟定了敌对和不公平的《瓦森纳协议》，即《常规武器和军民两用货物和技术出口管制协议》。

Chinese companies need to participate more in the semiconductor industry chain, which may not have much impact now, but its importance will be highlighted in the future. There is still a big gap between the Chinese semiconductor industry and its international counterparts, and overall, they are still trying to catch up.

中国企业需要更多地参与到半导体产业链中，这一点现在可能没有太大的影响，但未来的重要性将会凸显出来。中国半导体产业与国际同行之间仍有很大差距，总体而言，他们仍在努力追赶。

Some small specialized, refined, characteristic, innovative companies, although rarely appear in the spotlight, but they silently target market segments, and strive to polish some products, successfully gain a foothold in the global semiconductor industry chain, and stabilize this trillion-level market.

一些小的专业化、精细化、有特色、有创新的公司，虽然很少出现在聚光灯下，但他们默默地瞄准细分市场，努力打磨一些产品，成功地在全球半导体产业链中站稳脚跟，稳定了这个万亿级的市场。

The above image shows an interior view of the Thinkon Semiconductor monocrystalline silicon rod workshop.

上图显示了Thinkon半导体单晶硅棒车间的内部视图。

Thinkon Semiconductor started producing monocrystalline silicon for etching because it was also quite profitable and had a lot in common with wafer production.

Thinkon半导体(Thinkon Semiconductor)开始生产用于蚀刻的单晶硅，因为利润也相当可观，而且与晶圆生产有很多共同点。

During wafer etching, silicon electrodes made of monocrystalline silicon are consumed at the same time as the wafer and need to be larger than the wafer size. For example, to process a 12-inch wafer, the size of the corresponding monocrystalline silicon material used for etching is usually at least 14 inches. In order to reduce costs, as the chip manufacturing process has advanced from 28 nm to 7 nm or even 5 nm, the mainstream wafer size used in advanced processes has increased from 8 inches to 12 inches or larger. This also means that the size of the monocrystalline silicon used for etching must be increased accordingly.

在晶圆刻蚀过程中，由单晶硅制成的硅电极与晶圆同时消耗，需要比晶圆尺寸更大。例如，要加工12英寸的晶圆，用于蚀刻的相应单晶硅材料的尺寸通常至少为14英寸。出于降低成本的考虑，当芯片制造工艺从28纳米推进到7纳米甚至5纳米时，先进工艺中使用的主流晶圆尺寸已经从8英寸增加到12英寸甚至更大。这也意味着用于蚀刻的单晶硅的尺寸必须相应增大。

Its 8-inch semiconductor silicon polished wafer products.

这是8英寸半导体硅抛光晶圆产品。

Within a few months of its founding, the company achieved volume production of 14 inches to 19 inches. In May 2020, a high quality silicon single crystal with a diameter of 22 inches was successfully grown.

在成立后的几个月里，公司实现了14英寸到19英寸的量产。2020年5月，成功生长出直径为22英寸的高品质硅单晶。

The company’s high level of product yield and quality have been recognized by foreign customers, and become a partner of competitors. The company’s international market share continues to increase, successfully entered the international advanced semiconductor material industry chain system, and formed a global advantage in related segments.

公司高水平的产品良率和质量得到了国外客户的认可，并成为竞争对手的合作伙伴。公司国际市场占有率持续提升，成功进入国际先进半导体材料产业链体系，并在相关细分领域形成全球优势。

The successful development of low-defect growth technology of 8-inch crystal (i.e., wafer substrate) chip without magnetic field assistance has laid a good foundation for the development and mass production of the next 12-inch low-defect crystal chip. Many of the company’s technologies are at the international advanced level.

成功开发出无需磁场辅助的8英寸晶体(即晶圆基材)芯片低缺陷生长技术，为下一阶段12英寸低缺陷晶体芯片的研发和量产奠定了良好的基础。公司多项技术处于国际先进水平。

The lithography process requires more than 100 electronic grade high-purity industrial gases to cooperate with each other, each of which is indispensable.

光刻工艺需要100多种电子级高纯工业气体相互配合，每一种都是不可或缺的。

In 2018, Hunan Kemet Gas, which purifies food-grade carbon dioxide from industrial waste gas, has become an important supplier to many international food and beverage companies. In the same year, the company made the decision to climb the new peak of electronic special gas, invested 230 million yuan, and built a new factory in Yueyang, Hunan Province, with a strong R & D team.

2018年，从工业废气中净化食品级二氧化碳的湖南凯美特气体已成为许多国际食品和饮料公司的重要供应商。同年，公司做出了勇于攀登电子特种气新高峰的决定，投资2.3亿元，在湖南岳阳新建工厂，拥有强大的研发团队。

After two years of hard technical research, the series of products will be launched in 2020. The technical team continuously sends the sample data to the major international factories, and carries out multiple certification procedures in parallel and in parallel, so as to obtain the admission ticket as soon as possible.

经过两年艰苦的技术攻关，系列产品于2020年推出。技术团队不间断地将样品数据发送到各大国际工厂，并行、并行地进行多个认证程序，争取时间尽快获得准考证。

25 sets of electronic special gas and mixture production and processing equipment have been built, extending to a full range of electronic special gas fields, forming a professional electronic special gas and mixture research and development and production and processing base with greater influence in the industry. The company will contribute to expanding market supply.

建成电子特种气和混合气生产加工设备25套，延伸到全系列电子特种气田，形成了行业内具有较大影响力的专业电子特种气和混合气研发和生产加工基地。该公司将为扩大市场供应作出贡献。

The import and export control measures of the United States will not bring any benefits, but will only promote the progress and rise of China’s technology, causing many American companies to suffer certain economic losses, while seriously hurting the European semiconductor industry. The ASML CEO said that if this behavior in the United States is not stopped, European chips could disappear from the Chinese market within 15 years. The revised U.S. rules are aimed not at China but at Europe, Taiwan, South Korea and Japan, preventing other foreign chip and semiconductor equipment companies from competing with U.S. companies in the Chinese market.

美国的进出口管制措施不会带来任何好处，只会促进中国技术的进步和崛起，使许多美国企业遭受一定的经济损失，同时严重伤害欧洲半导体产业。ASML首席执行官表示，如果不停止美国的这种行为，欧洲芯片可能会在15年内从中国市场消失。美国修订后的规则并非针对中国，而是针对欧洲、台湾地区、韩国和日本，阻止其他外国芯片和半导体设备企业与美国企业争夺中国市场。

For mainland China, only by giving up illusions, focusing on solving problems, building its own core technology, strengthening national strategic scientific and technological manpower, and building an industrial ecology of its own core technology can it have a bright future.

对于中国大陆来说，只有放弃幻想，集中精力解决问题，建设自己的核心技术，加强国家战略科技人力，构建自己核心技术的产业生态，才会有光明的未来。

In 2002, the lithography machine was officially included in the “863 major scientific and technological research plan”. Subsequently, under the leadership of the Ministry of Science and Technology and the Shanghai Municipal Government, a number of domestic technology companies jointly established Shanghai Microelectronics to undertake key research tasks. Among them, the focus of research and development is 100nm step scan projection lithography machine.

2002年，光刻机正式列入“863重大科技攻关计划”。随后，在科技部和上海市政府的领导下，多家国内科技企业联合成立了上海微电子，承担攻关攻关任务。其中，重点研发的是100nm步进扫描投影光刻机。

Today, Shanghai Microelectronics has become the most advanced lithography equipment manufacturer in China, with 80% of the domestic market share of packaged lithography products and 40% of the global market share. In addition, its LED/MEMS/ power device lithography machine performance indicators are leading, and its LED lithography machine market share is the largest. However, in the field of front-end lithography machines for chip manufacturing, the most advanced equipment that Shanghai Microelectronics can currently mass produce is only at the 90nm process node. Although it said that it will launch a 28-nanometer process lithograph machine in 2021, it is far from the 5-nanometer process equipment of the Dutch company ASML.

如今，上海微电子已成为国内最先进的光刻设备制造商，封装光刻产品的国内市场占有率为80%，全球市场占有率为40%。此外，其LED/MEMS/功率器件光刻机性能指标领先，其LED光刻机市场份额最大。但在用于芯片制造的前端光刻机领域，上海微电子目前能够量产的最先进设备仅在90nm工艺节点。虽然表示将在2021年推出28纳米制程光刻机，但与荷兰阿斯麦公司(ASML)的5纳米以下制程设备相差甚远。

By 1965, the first batch of integrated circuits were born in Beijing, Shijiazhuang, Shanghai and other places. This marked the beginning of the application of lithography technology in chip manufacturing.

1965年，第一批集成电路在北京、石家庄、上海等地诞生。这标志着光刻技术在芯片制造中的应用的开始。

In 1980, Tsinghua University developed a distributed projection lithography machine with an accuracy of 3 microns. In 1981, the Institute of Semiconductors of the Chinese Academy of Sciences developed the JK-1 semi-automatic proximity lithography machine. In 1982, the Chinese Academy of Sciences 109 plant developed ka-75-1 lithography machine.

1980年，清华大学研制出精度为3微米的分布式投影光刻机。在1981年，中国科学院半导体研究所发展了JK-1半自动接近光刻机。1982年，中国科学院109厂研制了ka -75-1光刻机。

The level of equipment is not low, and even close to the international mainstream level at that time. In 1985, the step projection lithography machine developed by CEC 45 was certified by the Electronic Technology Department as being up to the level of the 4800DSW lithography machine introduced by GCA in 1978.

装备水平不低，甚至接近当时的国际主流水平。1985年，CEC 45研制的分步投影光刻机被电子技术部鉴定为达到了GCA公司1978年推出的4800DSW光刻机的水平。

However, affected by this, at the beginning of the market, it conquered technology and manufacturing equipment, and it has a representative of core strength. If you look at the early development of domestic lithography machines, you can also find that the foundation was laid in the 1950s, and in the 1960s and 1970s, it took a step forward. In the early 1980s, it was second only to the United States and even ahead of Japan and Taiwan.

但受此影响，在市场化刚起步的时候就征服了技术和制造设备，更具有核心实力的代表。如果梳理一下国内光刻机的早期发展，也可以发现，50年代奠定了基础，到了60、70年代，又向前迈进了一步。在20世纪80年代初，它仅次于美国，甚至领先于日本和台湾地区。

In general, for more than two decades, the older generation of revolutionaries and builders dedicated their youth to creating a special glory for China’s semiconductor industry: self-sufficiency of the whole industry chain from single crystal preparation, equipment manufacturing to integrated circuit manufacturing. The strength of self-sufficiency has gradually reached its peak, basically not dependent on foreign imports.

总的来说，二十多年来，老一辈的革命者和建设者奉献了他们的青春，为中国半导体产业创造了一个特殊的荣耀:从单晶制备、设备制造到集成电路制造的全产业链自给自足。自给自足的实力已逐渐达到顶峰，基本不依赖国外进口。

In 1985 and 1994, the 45 Research Institute of China Electronics Group developed G-line 1.5 micron and 0.8 micron step projection lithography machines respectively. In 1991, the Institute of Optoelectronics of the Chinese Academy of Sciences developed a synchrotron radiation X-ray engraving machine with a resolution of 1 micron.

1985年和1994年，中国电子集团45研究所分别研制了g线1.5微米和0.8微米分步投影光刻机。1991年，中国科学院光电子研究所研制出分辨率为1微米的同步辐射x射线雕刻机等。

In addition, in the context of opening up to the outside world, the trend of “buying is better than doing” has spread rapidly in China. Therefore, local governments have purchased and introduced a large number of foreign semiconductor equipment and production lines. A large number of enterprises have given up the policy of independence, self-reliance, blind acquisition, blind opening up, and embarked on the “trade, industry, technology” oriented development route.

此外，在对外开放的背景下，“买不如做”的趋势在中国迅速蔓延。因此，地方政府购买并引进了大量的国外半导体设备和生产线。大量企业放弃了独立自主、自力更生的政策，盲目收购、盲目开放，走上了“贸、工、技”为导向的发展路线。

Since then, due to the lack of support and top-level design, there has been a disconnect between domestic IC research, education and industry. In terms of scientific research, China follows the technical standards and systems formulated abroad. In terms of education, majors related to finance and trade became popular, while software engineers became less popular.

此后，由于缺乏支持和顶层设计，国内集成电路的研究、教育和产业出现了脱节。在科学研究方面，中国遵循国外制定的技术标准和技术体系。在教育方面，与金融和贸易相关的专业变得流行，而软件工程师变得不受欢迎。

In the semiconductor industry, some semiconductor companies are keen to assemble for foreign companies in exchange for the economic benefits of a large number of cheap labor. The few firms that still stick to their own path are squeezed by comprador and foreign capital. As a result, since 1987, China’s original independent semiconductor research and industrial system has collapsed.

在半导体行业，部分半导体企业热衷于为外国企业组装，以换取大量廉价劳动力的经济利益。极少数仍然坚持自主路线的公司只能在买办和外国资本的挤压下生存。因此，自1987年以来，中国原有的独立半导体研究和工业体系已经崩溃。

In the entire 1990s, without the support of the market, funds and talents, domestic lithography machines did not achieve greater achievements, and the gap with the international level is getting larger and larger.

在整个90年代，没有市场、资金和人才的支持，国产光刻机并没有取得更大的成就，与国际水平的差距越来越大。

In addition, changes in the international political environment have brought enormous challenges. As early as under the framework of the “Paris Coordination Association”, the West has been implementing high-tech embargoes on socialist countries, including restricting the export of lithography machines. With the end of the Cold War and the collapse of Batumi, China became a prime target.

此外，国际政治环境的变化也带来了巨大的挑战。早在“巴黎协调协会”框架下，西方就一直对社会主义国家实施高科技禁运，包括限制光刻机出口。随着冷战的结束和“巴统”的解体，中国成为主要目标。

In July 1996, under the leadership of the United States, 33 Western countries signed the Wassenaar Agreement on the Control of Exports of Conventional Arms and Dual-Use Items and Technologies. Batumi used to have only 17 members, while the Wassenaar Agreement now has 42, including Russia.

1996年7月，在美国的领导下，33个西方国家签署了《关于控制常规武器和两用品及技术出口的瓦森纳协定》。“巴统”过去只有17个成员国，而“瓦森纳尔协定”现在有包括俄罗斯在内的42个成员国。

Under this framework, Western countries generally follow the “N-2” principle to approve the export of semiconductor technology and lithography machines, which are always at least two generations behind the most advanced technology. If there is a proper delay in the approval process, basically China’s existing equipment technology will be intentionally three generations or more behind (just second best, highest priced). Needless to say, the export of lithography machines even have more reservations, such as prohibiting the production of domestic independent chips, and prohibiting the production of chips for military scientific research and national defense. In addition, the Wassenaar Agreement also restricts the access of Chinese engineers to the core departments of well-known semiconductor companies in Europe and the United States to prevent technology leakage.

在这一框架下，西方国家一般遵循“N - 2”原则批准出口半导体技术和光刻机，这些技术总是落后于最先进的技术至少两代。如果在审批过程中有适当的延迟，基本上中国现有的设备技术将故意落后三代或更多(只是第二好，价格最高)。不用说，出口的光刻机甚至有更多的保留，比如禁止为国产自主芯片代工，禁止为军事科研和国防生产芯片。此外，《瓦森纳协议》还限制中国工程师进入欧美知名半导体公司的核心部门，防止技术泄露。

It is also worth noting that although the Wassenaar Agreement allows member states to exercise controls on their technology exports on a voluntary basis, in practice member states are influenced by the United States on important technology export decisions. For example, the United States has intervened to block the export of lithography machines and radar systems to China.

同样值得注意的是，虽然《瓦森纳协定》允许成员国在自愿的基础上对其技术出口实施控制，但实际成员国在重要的技术出口决策上都受到美国的影响。例如，美国曾干预阻止向中国出口光刻机和雷达系统。

In the case of increasingly limited external development space, in order to find a way out, China has proposed “market for technology” and significantly reduce tariffs. However, this has dealt a serious blow to the domestic integrated circuit industry, including lithography machines. Since then, the domestic lithography machine market has gradually been dominated by European, American and Japanese companies.

在外部发展空间日益受限的情况下，为了寻找出路，中国曾提出“以市场换技术”，大幅降低关税。然而，这对包括光刻机在内的国内集成电路产业造成了严重打击。此后，国内光刻机市场逐渐被欧美和日本公司所主导。

In 1999, when NATO invaded Kosovo, U.S. electronic information warfare paralyzed nearly all of Yugoslavia’s Internet communications systems. This shocked the Chinese government. At that time, the Ministry of Information Industry and the Ministry of Science and Technology held several emergency meetings to discuss how to respond to such a war.

1999年，当北约入侵科索沃时，美国的电子信息战几乎瘫痪了南斯拉夫所有的网络通信系统。这震惊了中国政府。当时，信息产业部和科技部召开了几次紧急会议，讨论如何应对这样一场战争。

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