美国网友:西方制裁,没美国技术,中国能造出芯片来吗（下）_风闻

What threats will national information security face in the event of war with the United States?

当与美国开战时，国家信息安全将面临哪些威胁?

Based on the consideration of national information security and industrial development, in June 2000, The State Council issued Several Policies on Encouraging the development of the Software Industry and integrated Circuit Industry, that is, Document 18. Stimulated by policy subsidies and a huge market, China’s entire semiconductor industry has experienced a boom in overseas returnees’ entrepreneurship and independent development.

基于国家信息安全和产业发展的考虑，2000年6月，国务院发布了《关于鼓励软件产业和集成电路产业发展的若干政策》，即18号文。在政策补贴和巨大市场的刺激下，中国整个半导体产业经历了海归创业和自主发展的热潮。

In 2002, the lithography machine was included in the “863 major scientific and technological research plan”. Among them, Shanghai Microelectronics has been the main undertaker of the research project, and the original distributed projection lithography R & D team of CLP 45 Branch moved to Shanghai to participate in “assistance”. Since then, domestic lithography enterprises have awakened again.

2002年，光刻机被列入“863重大科技攻关计划”。其中，上海微电子一直是研究项目的主要承担者，中电45分公司原有的分布式投影光刻机研发团队搬到上海参与“协助”。此后，国内光刻机企业再次觉醒。

Unfortunately, at that time, the requirements for technology, precision and speed of lithography machines were already high. It has gradually become the product of state-of-the-art technologies in mathematics, optics, fluid mechanics, polymer physics and chemistry, surface physics and chemistry, precision instrumentation, machinery, automation, as well as software and image recognition. In addition, temperature, humidity, lighting, etc., will affect the success or failure of the final development. Almost everything was started from scratch, with many restrictions imposed by developed countries.

不幸的是，在那个时候，光刻机对技术、精度和速度的要求已经很高了。它已逐渐成为集数学、光学、流体力学、高分子物理与化学、表面物理与化学、精密仪器、机械、自动化以及软件和图像识别领域顶尖技术的产物。另外，温度、湿度、光照等都会影响到最终显影的成败。几乎所有的事情都是从零开始的，发达国家施加了许多限制。

Therefore, in 2002, China once again embarked on the first step on the difficult road of developing domestic lithography machines. In the process of developing 100nm front-end lithography machine, some personnel were transferred to develop package lithography machine.

于是，中国在2002年又一次踏上了发展国产光刻机的艰难道路的第一步。在开发100nm前端光刻机的过程中，调来部分人员开发封装光刻机。

At the beginning of the establishment of Shanghai Micro Electronics, the international lithography machine technology has made a major breakthrough. Prior to this, the photolithographic light source had remained at 193nm for as long as 20 years without progress. Scientists and industry from around the world have been discussing solutions. Finally, in 2002, TSMC’s submersible 193nm solution was successful. Since then, ASML has seized the opportunity to work with TSMC to develop a prototype within a year, followed by the introduction of the immersion lithography machine XT:1700i. The device is 30% higher than the previous state-of-the-art dry lithography machine and can be used for 45nm mass production, accelerating the dominance of ASML.

上海微电子成立之初，国际光刻机技术取得了重大突破。在此之前，光刻光源一直停留在193nm，长达20年没有进步。来自世界各地的科学家和工业界一直在讨论解决方案。最终，在2002年，台积电提出的浸没式193nm解决方案获得成功。此后，ASML抓住了与台积电合作的机会，在一年内开发出原型机，随后推出了浸入式光刻机XT:1700i。该设备比之前最先进的干式光刻机提高30%，可用于45nm量产，加速了ASML的主导地位。

According to the official website of Shanghai Microelectronics, as of March 2020, the company has more than 3,200 patents and patent applications, and has excellent performance in the technical fields of lithography, laser, detection and so on.

据上海微电子官网显示，截至2020年3月，公司拥有专利及专利申请3200多项，在光刻、激光、检测等技术领域表现优异。

At the same time, China has just launched the 193nm ArF lithography machine project, which is more than 20 years behind the international level. Therefore, Shanghai Microelectronics began to catch up, and in 2007 announced a breakthrough in 365nm light wavelength DUV(Deep ultraviolet) lithography technology, developed a 90nm process distributed projection lithography machine.

与此同时，中国刚刚启动了193nm ArF光刻机项目，与国际水平相差20多年。于是，上海微电子开始奋起直追，并于2007年宣布突破365nm光波长的DUV(深紫外)光刻技术，研制出90nm工艺的分布式投影光刻机。

Foreign countries imposed a tacit embargo on Shanghai Microelectronics. This resulted in the prototype becoming a display that could not be put into commercial production. Therefore, in 2008, the state set up the “Very large scale integrated circuit manufacturing equipment and complete process Special” (Special 02), focusing on the development of high-end assembly technology, as well as materials, processes and other industrial supporting capabilities.

外国对上海微电子公司实行了默认的禁运。这导致原型机成为一个显示器，无法投入商业生产。因此，2008年，国家设立了“超大规模集成电路制造装备及成套工艺专项”(专项02)，重点发展高端组装技术，以及材料、工艺等产业配套能力。

Since then, in addition to the whole machine manufacturing, the state has also supported the research and development of a number of supporting enterprises such as Changchun Institute of Optoelectronics, Shanghai Institute of Optoelectronics, and National Institute of Science and Technology Precision Exposure optical system. Kieer is responsible for the breakthrough immersion system for DUV lithography machines. With continuous investment, the lithography machine industry chain has made a breakthrough. In 2016, the first NA=0.75 projection lithography objective system developed by Goke Precision for high-end IC manufacturing in China, and the first 90nm node ArF projection lithography exposure optical system developed by King Optics have been delivered.

此后，除了整机制造外，国家还扶持了长春光电研究所、上海光电研究所、国家科技精密研究院曝光光学系统等一批配套企业的研发。奇尔机电负责突破DUV光刻机的液浸系统。随着不断的投入，光刻机产业链取得了突破。2016年，国科精密研发的国内第一台用于高端IC制造的NA=0.75投影光刻机物镜系统，以及国王光学研发的第一台90nm节点ArF投影光刻机曝光光学系统已经交付。

In the same year, Shanghai Microelectronics SSX600 series three step scan projection lithography machines realized mass production, of which SSA600/20 lithography machine resolution reached 90nm. However, this also means that it took Shanghai Microelectronics nine years to achieve the mass production of 90nm lithography machines.

同年，上海微电子SSX600系列三台步进扫描投影光刻机实现量产，其中SSA600/20光刻机分辨率达到90nm。然而，这也意味着上海微电子用了9年时间才实现了90nm光刻机的量产。

The 90nm process optical engraving machine is generally used for the production of non-core chips such as power management chips and mcu, and cannot meet the needs of products such as smart phone processors.

90nm制程光刻机一般用于电源管理芯片、mcu等非核心芯片的生产，无法满足智能手机处理器等产品的需求。

However, although the domestic lithography machine has not yet come out of the dilemma, it has seen the light in the details. In 2016, Huashuo Crystal successfully developed two sets of double bench prototypes, and passed the 02 special acceptance. Since then, Huashuo Crystal has broken the monopoly of ASML and become the second company in the world to master the technology.

然而，国产光刻机虽然还没有走出困境，但在细节上已经看到了曙光。2016年，华烁晶科成功研制出两套双工作台样机，并通过02专项验收。此后，华烁晶科打破了ASML的垄断，成为全球第二家掌握该技术的公司。

In the complex industry chain of lithography machines, it can be divided into two parts. First, the core components of the lithography machine, including light source, lens, double working stage, immersion solution, exposure optics and other key subsystems; The other is the lithographic support system. Equipment includes photoresist, photomask, adhesive development, lithographic gas and defect detection.

在光刻机复杂的产业链中，可以分为两个部分。一是光刻机的核心部件，包括光源、镜头、双工作级、浸没液、曝光光学等关键子系统;另一个是光刻支撑系统。设备包括光刻胶、光掩膜、胶粘剂显影、光刻气体和缺陷检测等。

On June 21, 2017, the “Key technologies of extreme ultraviolet lithography” led by Changchun Institute of Optics, Fine Mechanics and Physics of the Chinese Academy of Sciences (now Beijing Guowang Optics) passed acceptance. In November 2018, the “super resolution lithography equipment” developed by the Chinese Academy of Sciences passed acceptance. Its lithographic resolution is as high as 22nm, and combined with double exposure technology, it can also be used to manufacture 10nm class chips in the future. In 2019, Tsinghua University and Huashuo Precision two-stage system completed the development and trial production base construction.

2017年6月21日，中科院长春光学精密机械与物理研究所(现北京国望光学)牵头的“极紫外光刻关键技术”通过验收。2018年11月，中科院研制的“超分辨率光刻设备”通过验收。其光刻分辨率高达22nm，结合双曝光技术，未来还可用于制造10nm级别的芯片。2019年，清华大学与华烁精密双级系统完成研制和试产基地建设。

The success of the two-stage exposure system and the key system has become the starting point of the domestic lithography industry chain. At present, the immersion system jointly developed by the State Key Laboratory of Fluid Power and Electromechanical Systems of Zhejiang University and Qier Electromechanical ranks third in the world.

曝光系统与关键系统双阶段的成功，成为国内光刻机产业链的起点。目前，由浙江大学流体动力与机电系统国家重点实验室与祁尔机电共同研发的浸入式系统位居世界第三。

The excimer laser light source system of the Institute of Optoelectronics of the Chinese Academy of Sciences is in charge of industrial transformation by Beijing Keyi Hongyuan. The research results of 40W 4kHz ArF light source are presented. This achievement ranks third in the world.

中国科学院光电子研究所的准分子激光光源系统由北京科益宏远负责产业转型。给出了40W 4kHz ArF光源的研究成果。这一成就位居世界第三。

Specifically, Shanghai Microelectronics will be responsible for the design and overall integration of the 28-nanometer lithography machine. Keyi Hongyuan provides the light source system, Guowang Optics provides the objective lens system, and Guoke Precision provides the exposure optical system. Huashuo Crystal Co., Ltd. provides dual workbenches, and Keer Electric Co., Ltd. provides immersion systems.

具体来说，上海微电子将负责28纳米光刻机的设计和整体集成。科益宏远提供光源系统，国旺光学提供物镜系统，国科精密提供曝光光学系统。华烁晶科提供双工作台，奇尔机电提供浸入式系统。

Once the domestic lithography machine breaks through the technology below 28nm, China will have a great market potential trend. In terms of equipment categories, lithography machines are divided into front lithography machines and back lithography machines. The front lithography machine is used for chip manufacturing, and the back lithography machine is mainly used for chip packaging. Shanghai Microelectronics is the leading player in the field of back-end lithography.

一旦国产光刻机突破28nm以下技术，中国将有很大的市场潜力趋势。在设备类别上，光刻机分为正面光刻机和背面光刻机。正面光刻机用于芯片制造，背面光刻机主要用于芯片封装。上海微电子是后端光刻机领域的主导者。

In terms of process technology, the lithography machine can be divided into maskless lithography machine and mask lithography machine. The former has relatively low technical barriers and is generally used in specific chip fields such as high-resolution masks and integrated circuit prototype verification chips. Mask lithography machines with high technical barriers are mostly used in the front end of advanced manufacturing processes.

从工艺技术上讲，光刻机可分为无掩模光刻机和掩模光刻机。前者技术壁垒相对较低，一般用于高分辨率掩模、集成电路原型验证芯片等特定芯片领域。技术壁垒较高的掩模光刻机多用于先进制造工艺的前端工序。

If further subdivided, the maskless lithography machine can be divided into electron beam direct writing lithography machine, ion beam direct writing lithography machine, laser direct writing lithography machine. Mask lithography machines can be divided into contact/proximity lithography machines and projection lithography machines. In addition, the mask lithography machine can also be divided according to the production of the lithography light source.

如果再细分，无掩模光刻机可分为电子束直写光刻机、离子束直写光刻机、激光直写光刻机。掩模光刻机可分为接触式/接近式光刻机和投影式光刻机。另外，掩模光刻机还可以根据光刻光源的产生进行划分。

At present, the 193nm wavelength ArF(argon fluoride) immersion lithography machine being developed by Shanghai Microelectronics belongs to the fourth generation lithography machine, which can be used to produce 45-22nm process chips. The fifth-generation EUV lithography machine uses a 13.5nm wavelength light source and is an indispensable tool to break through the 7nm chip process node.

目前上海微电子正在研发的193nm波长ArF(氟化氩)浸没式光刻机属于第四代光刻机，可用于生产45-22nm制程芯片。第五代EUV光刻机采用13.5nm波长光源，是突破7nm芯片制程节点不可或缺的工具。

As the fourth generation light source in the history of mask lithography, the 193nm optical wavelength ArF is already the world’s leading level of DUV lithography. Therefore, if Shanghai Microelectronics successfully designs and integrates the ArF immersion lithography machine with a wavelength of 193nm, it will mean that it is close to or catch up with ASML in the field of DUV lithography machines.

作为掩模光刻机历史上的第四代光源，193nm光波长ArF已经是世界领先水平的DUV光刻机。因此，如果上海微电子成功设计并集成了波长为193nm的ArF浸没式光刻机，将意味着其在DUV光刻机领域接近或赶超ASML。

EUV lithography is not required. The case often used to support this view is that SMIC’s N+1 and N+2 generation processes do not use EUV processes, while TSMC only started to introduce EUV lithography machines in the third generation 7nm process.

不需要EUV光刻机。经常被用来支持这一观点的案例是中芯国际的N+1和N+2代工艺不会使用EUV工艺，而台积电在第三代7nm工艺中才开始引入EUV光刻机。

Shanghai Microelectronics has long had only a few hundred R&D staff, reaching 1,150 in early 2019. Under the obstruction of the United States, independent research and development of lithography technology has become significant. China needs to increase its technology and patent accumulation. In the international competition, the innovation and development of lithography machine technology is a multi-dimensional contest.

上海微电子长期以来只有几百名研发人员，2019年初达到1150人。在美国百般阻挠下，自主研发光刻技术变得意义重大。中国需要增加技术和专利积累。在国际竞争中，光刻机技术的创新与发展是一场多维度的较量。

Entering the new century, the entire Chinese semiconductor industry suddenly realized. Nine years later, Shanghai Microelectronics breakthrough 90nm lithography machine technology, nine years later to achieve mass production; Its 193nm optical wavelength ArF immersion lithography machine has taken nearly 20 years to achieve a breakthrough.

进入新世纪，整个中国半导体产业迎来曙光。9年后，上海微电子突破90nm光刻机技术，9年后实现量产;其193nm光波长ArF浸没式光刻机历经近20年才取得突破。

In the field of lithography machines, we need a strong strategic investment from the active and promising Chinese government, and we need the collaborative development of the government, scientific research and enterprises, because this is a country

在光刻机领域，需要积极有为的中国政府的大力战略投入，需要政府、科研、企业的协同发展，因为这是一个国家

Over the past 26 years, more than 400 enterprises and more than 300,000 scientists, engineers and technicians have participated in the construction of the BDS, which has conquered more than 160 key core technologies such as inter-satellite links and high-precision atomic clocks, and the localization rate of core components has reached 100 percent. Beidou navigation technology and ground enhancement technology integration, 5G, Internet of things, mobile Internet, cloud computing, edge computing, artificial intelligence, mechanism model and other new technology cluster, Beidou system has been applied to smart city, wearable devices, intelligent manufacturing, Internet of things, automatic driving, public infrastructure automation monitoring, smart agriculture, power grid security maintenance and other fields.

26年来，全国400多家企业、30多万名科学家、工程师和技术人员参与了北斗系统的建设，先后攻克了星间链路、高精度原子钟等160多项关键核心技术，核心部件国产化率达到100%。北斗导航技术与地面增强技术融合，5G、物联网、移动互联网、云计算、边缘计算、人工智能、机制模型等新技术集群，北斗系统已应用于智慧城市、可穿戴设备、智能制造、物联网、自动驾驶、公共基础设施自动化监控、智慧农业、电网安全维护等领域。

These 300,000 or so scientists, engineers and technicians can help domestic lithography machines break through the technology below 28nm and complete the goal of manufacturing in China by 2025.

这30万左右的科学家、工程师和技术人员可以帮助国产光刻机突破28nm以下的技术，并在2025年之前完成中国制造的目标。

Nowadays, the state’s support for independent innovation is unprecedented, and Chinese people must cherish this special era. The logic behind the lithography machine industry is that it can manufacture mobile phones, computers, televisions, missiles, space shuttles and other equipment chips, involving the national economy and people’s livelihood, but also involving the development of science and technology, military, and social economy. In a people’s country, this cause is bound to receive strong support. At present, the funds are in place, the industrial chain is gathered around the future lithography giants in mainland China, and all links of the industrial chain such as double tables, optics, light sources, objective lenses, and immersion systems are mobilized. A temporarily backward but basically self-sufficient industrial chain is slowly growing in China.

如今，国家对自主创新的支持是前所未有的，中国人必须珍惜这个特殊的时代。光刻机产业背后的逻辑是，它可以制造手机、电脑、电视、导弹、航天飞机等设备芯片，涉及国计民生，也涉及科技、军事、社会经济的发展。在一个人民的国家里，这项事业必然会得到大力支持。目前，资金到位，产业链聚集在中国大陆未来的光刻机巨头周围，双工作台、光学、光源、物镜、浸入系统等产业链的各个环节都被调动起来。一条暂时落后但基本可以自给自足的产业链正在中国慢慢成长。

Shanghai Microelectronics has said that a new generation of domestic lithography machines is expected to be mass-produced in 2021, and a domestic 28nm chip production line is expected to be built in 1-2 years.

上海微电子已经表示，新一代国产光刻机预计将于2021年量产，国产28nm芯片生产线预计将在1-2年内建成。

As of June 25, 2021, Huawei has completed the assembly of a fully autonomous and controllable 28nm chip production line. As long as Shanghai Microelectronics delivers the 28nm lithography machine on time in the second half of 2021, Huawei can achieve the mass production of 28nm chips. Qualcomm has not been helpful, and while it is approved to supply Huawei, they are outdated chips. We’re not laying people off. In the future, Huawei will not only design high-end chips, but also produce high-end chips.

截至2021年6月25日，华为完成了完全自主可控的28nm芯片生产线的组装工作。只要上海微电子在2021年下半年按时交付28nm光刻机，华为就可以实现28nm芯片的量产。高通一直没有提供帮助，虽然它被批准向华为供应，但它们都是过时的芯片。我们不会裁员。华为未来不仅会设计高端芯片，还会生产高端芯片。

Even if the U.S. government continues to take tough measures to block and isolate scientific and technological personnel on China-related issues, it is almost impossible for the United States to confront China, which has a strong endogenous resource capacity. Only by adhering to the original intention of innovation and following the laws of technology and the market can China have a bright future. Using politics as a weapon, or being used by political forces, will eventually pay a price in the market.

即使美国政府在涉华问题上继续采取强硬手段封锁和孤立科技人员，美国也几乎不可能对抗拥有极强内生资源能力的中国。只有坚持创新的初心，遵循技术和市场的规律，中国人才能拥有光明的未来。把政治当作武器，或者被政治势力利用，最终都会在市场上付出代价。

In the future, China will continue to increase investment in research and development, strengthen the construction of talent teams, focus on the pursuit of excellent quality, and consolidate technology.

未来，中国将继续加大研发投入，加强人才队伍建设，专心追求卓越品质，夯实技术。

They have overcome many production problems and filled domestic gaps, while expanding China’s semiconductor industry chain and attracting more high-quality foreign investment, high-end talents and advanced technologies.

他们攻克了许多生产难题，填补了国内空白，同时扩大了中国半导体产业链，吸引了更多优质外资、高端人才和先进技术。

In addition, cyber attacks on China by the United States have increased year after year.

此外，美国对中国的网络攻击也连年增加。

Who is to blame for these not-so-smart moves?

谁该为这些不太聪明的举动负责呢?

This is part of a view on whether China can develop a fully autonomous chip manufacturing system without relying on any foreign technology.

这是对中国能否在不依赖任何外国技术的情况下发展出完全自主的芯片制造体系的部分看法。

It’s another day in the sun.

这是阳光下的另一天。

知识万物